Patent · US Active

Immersion exposure technique

US7679718B2 · kind B2 · utility

1Cited by
13References
10Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJun 7, 2007
Grant dateMar 16, 2010
Priority date—
Expiry dateJan 16, 2028

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/70341
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

An exposure apparatus including a projection optical system which projects a pattern of an original onto an exposed surface of a substrate, and a supply nozzle configured to supply the liquid through a supply opening into a gap between a final surface of the projection optical system and a part of the exposed surface of the substrate. The supply opening is arranged more distant than the final surface of the projection optical system from the exposed surface of the substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.