Wafer movement control macros
US7680559B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 8, 2005 |
| Grant date | Mar 16, 2010 |
| Priority date | — |
| Expiry date | Jan 1, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67745
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A computer-implemented method for creating a set of wafer transfer instructions configured to transfer a wafer between an origination wafer-holding location and a destination wafer-holding location in a plasma cluster tool, which has a plurality of wafer-holding locations. The method includes receiving a first user-provided location indicator and a second user-provided location indicator, which graphically identify the origination wafer-holding location and the destination wafer-holding location respectively on the on-screen graphical representation of the plasma cluster tool. The method further includes ascertaining data pertaining to a path between the first user-provided location indicator and the second user-provided location indicator. The method further includes forming the set of wafer transfer instructions responsive to the data pertaining to the path. The set of wafer transfer instructions is configured to transfer the wafer along a set of wafer-holding locations associated with the path.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.