Perimeter partition-valve with protected seals and associated small size process chambers and multiple chamber systems
US7682454B2 · kind B2 · utility
506Cited by
27References
50Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 9, 2004 |
| Grant date | Mar 23, 2010 |
| Priority date | — |
| Expiry date | Feb 3, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68792
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A seal-protected perimeter partition valve apparatus (450) defines a vacuum and pressure sealed space (401) within a larger space (540) confining a substrate processing chamber with optimized geometry, minimized footprint and 360° substrate accessibility. A compact perimeter partitioned assembly (520) with seal protected perimeter partition valve (450) and internally contained substrate placement member (480) further provides processing system modularity and substantially minimized system footprint.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.