Resist composition, method of forming resist pattern, novel compound, and acid generator
US7682772B2 · kind B2 · utility
11Cited by
3References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 5, 2008 |
| Grant date | Mar 23, 2010 |
| Priority date | — |
| Expiry date | Nov 5, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/123
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A compound represented by general formula (I); and a compound represented by general formula (b1-1).[Chemical Formula 1]X-Q1-Y1—SO3−M+ (I)X-Q1-Y1—SO3−A+ (b1-1)wherein Q1 represents a divalent linkage group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an —SO2— bond in the structure thereof; M+ represents an alkali metal ion; and A+ represents an organic cation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.