Overlay metrology target
US7684038B1 · kind B1 · utility
7Cited by
6References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 4, 2008 |
| Grant date | Mar 23, 2010 |
| Priority date | — |
| Expiry date | Apr 7, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70633
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In one embodiment, a metrology target for determining a relative shift between two or more successive layers of a substrate may comprise; an first structure on a first layer of a substrate and an second structure on a successive layer to the first layer of the substrate arranged to determine relative shifts in alignment in both the x and y directions of the substrate by analyzing the first structure and second structure overlay.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.