Inventor · Milpitas, CA, US

Vladimir Levinski

92Patents
12h-index
106Co-inventors
87Inventor score

Filing activity: May 14, 2003 → May 24, 2024

Most-cited inventions

PatentTitleAreaCited byStatus
US8441639B2 Metrology systems and methods Physics 32 Active
US7528941B2 Order selected overlay metrology Physics 29 Active
US9739702B2 Symmetric target design in scatterometry overlay metrology Physics 22 Active
US7671990B1 Cross hatched metrology marks and associated method of use Physics 21 Active
US9678421B2 Target element types for process parameter metrology Electricity 19 Active
US9080971B2 Metrology systems and methods Physics 15 Active
US8896832B2 Discrete polarization scatterometry Physics 15 Active
US7310789B2 Use of overlay diagnostics for enhanced automatic process control Physics 14 Active
US10197389B2 Approaches in first order scatterometry overlay based on introduction of auxiliary electromagnetic fields Physics 13 Active
US8345243B2 Overlay metrology target Physics 13 Active
US10228320B1 Achieving a small pattern placement error in metrology targets Physics 13 Active
US11073768B2 Metrology target for scanning metrology Physics 12 Active
US7433039B1 Apparatus and methods for reducing tool-induced shift during overlay metrology Physics 12 Expired
US9581430B2 Phase characterization of targets Physics 12 Active
US8873054B2 Metrology systems and methods Physics 12 Active
US8243273B2 Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methods Electricity 11 Active
US7602491B2 Optical gain approach for enhancement of overlay and alignment systems performance Physics 10 Active
US11164307B1 Misregistration metrology by using fringe Moiré and optical Moiré effects Physics 10 Active
US9864209B2 Self-moire target design principles for measuring unresolved device-like pitches Physics 9 Active
US8913237B2 Device-like scatterometry overlay targets Electricity 8 Active
US9454072B2 Method and system for providing a target design displaying high sensitivity to scanner focus change Physics 8 Active
US7684038B1 Overlay metrology target Physics 7 Active
US10824079B2 Diffraction based overlay scatterometry Physics 7 Active
US9927718B2 Multi-layer overlay metrology target and complimentary overlay metrology measurement systems Physics 7 Active
US7724375B1 Method and apparatus for increasing metrology or inspection tool throughput Physics 7 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.