Ion implanter for noncircular wafers
US7687786B2 · kind B2 · utility
7Cited by
9References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 16, 2008 |
| Grant date | Mar 30, 2010 |
| Priority date | — |
| Expiry date | Sep 25, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2007
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Ion implanters are especially suited to meet process dose and energy demands associated with fabricating photovoltaic devices by ion implantation followed by cleaving.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.