Debris prevention system, radiation system, and lithographic apparatus
US7687788B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 16, 2007 |
| Grant date | Mar 30, 2010 |
| Priority date | — |
| Expiry date | Feb 20, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70983
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A debris prevention system is constructed and arranged to prevent debris that emanates from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The debris prevention system includes an aperture that defines a maximum emission angle of the radiation coming from the radiation source, and a first debris barrier having a radiation transmittance. The first debris barrier includes a rotatable foil trap. The debris prevention system also includes a second debris barrier that has a radiation transmittance. The first debris barrier is configured to cover a part of the emission angle and the second debris barrier is configured to cover another part of the emission angle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.