Method for treatment of a gas stream containing silicon tetrafluoride and hydrogen chloride
US7691351B2 · kind B2 · utility
1Cited by
2References
68Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 2, 2008 |
| Grant date | Apr 6, 2010 |
| Priority date | — |
| Expiry date | Oct 28, 2028 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D2258/0216
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present invention is directed to a method for treatment of a gas stream comprising silicon tetrafluoride and hydrogen chloride. For example, the present invention is directed to a method for treatment of such a gas stream that involves contacting the gas stream with a metal that reacts with the hydrogen chloride to provide a treated gas stream having reduced hydrogen chloride content. The present invention is further directed to methods for subjecting silicon tetrafluoride and hydrogen chloride-containing gas streams to elevated pressure to provide gas streams suitable for transport.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.