Photomask blank and photomask
US7691546B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 8, 2005 |
| Grant date | Apr 6, 2010 |
| Priority date | — |
| Expiry date | Jan 9, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/68
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photomask blank to be used as a material for a photomask is provided with a mask pattern having a transparent area and an effectively opaque area to exposure light on a transparent substrate. On the transparent board, one or more layers of light shielding films are formed with or without other film (A) in between, at least one layer (B) which constitutes the light shielding film includes silicon and a transition metal as main component, and a molar ratio of silicon to the transition metal is silicon:metal=4-15:1 (atomic ratio). The photomask provided with the mask pattern having the transparent area and the effectively opaque area to exposure light on the transparent board is also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.