Satoshi Okazaki
54Patents
9h-index
59Co-inventors
81Inventor score
Filing activity: Mar 1, 1982 → Apr 5, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4431789A | Novel organopolysiloxane having alcoholic hydroxy groups and a method for the preparation thereof | Chemistry; Metallurgy | 97 | Expired |
| US5127330A | Method including treatment of ink on a plate to cause hardening at other than the ink outer surface before printing | Electricity | 47 | Expired |
| US7771893B2 | Photomask blank, photomask and fabrication method thereof | Emerging Cross-Sectional Technologies | 27 | Active |
| US7767366B2 | Photomask blank and photomask | Emerging Cross-Sectional Technologies | 27 | Active |
| US7736824B2 | Photomask blank, photomask, and method of manufacture | Emerging Cross-Sectional Technologies | 25 | Active |
| US7179545B2 | Halftone phase shift mask blank, and method of manufacture | Physics | 17 | Expired |
| US5422221A | Resist compositions | Physics | 16 | Expired |
| US6383944B1 | Micropatterning method | Electricity | 11 | Expired |
| US5773200A | Positive resist composition suitable for lift-off technique and pattern forming method | Physics | 11 | Expired |
| US8012654B2 | Photomask blank and photomask | Emerging Cross-Sectional Technologies | 9 | Active |
| US7767367B2 | Photomask blank and photomask making method | Emerging Cross-Sectional Technologies | 9 | Active |
| US6511778B2 | Phase shift mask blank, phase shift mask and method of manufacture | Physics | 7 | Expired |
| US8003284B2 | Photomask blank and photomask | Emerging Cross-Sectional Technologies | 7 | Active |
| US7625676B2 | Photomask blank, photomask and fabrication method thereof | Emerging Cross-Sectional Technologies | 6 | Active |
| US6218069A | Photosensitive resin composition and making process | Physics | 6 | Expired |
| US7790339B2 | Photomask blank | Emerging Cross-Sectional Technologies | 6 | Active |
| US7691546B2 | Photomask blank and photomask | Physics | 6 | Active |
| US6242151A | Polymers, resist compositions and patterning method | Physics | 5 | Expired |
| US7618753B2 | Photomask blank, photomask and method for producing those | Physics | 5 | Active |
| US6503669B2 | Photomask blank, photomask and method of manufacture | Chemistry; Metallurgy | 4 | Expired |
| US6790129B2 | Method for polishing angular substrates | Performing Operations; Transporting | 4 | Expired |
| US7989124B2 | Photomask blank and photomask making method | Emerging Cross-Sectional Technologies | 4 | Active |
| US7556892B2 | Halftone phase shift mask blank, halftone phase shift mask, and pattern transfer method | Emerging Cross-Sectional Technologies | 4 | Active |
| US6221989A | Polymers and positive resist compositions | Chemistry; Metallurgy | 4 | Expired |
| US6641958B2 | Phase shift mask blank, phase shift mask, and methods of manufacture | Physics | 4 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.