Patent · US Active

Lithography projection objective, and a method for correcting image defects of the same

US7692868B2 · kind B2 · utility

4Cited by

4References

39Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Ulrich Loering · Schwäbisch Gmünd, DE
Vladan Blahnik · Aalen, DE
Wilhelm Ulrich · Aalen, DE
Daniel Kraehmer · Aalen, DE
Norbert Wabra · Werneck, DE

Key dates

Filing date	Nov 5, 2008
Grant date	Apr 6, 2010
Priority date	—
Expiry date	Nov 5, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/7015
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Projection objectives, as well as related components, systems and methods, are disclosed. In general, a projection objective is configured to image radiation from an object plane to an image plane. A projection objective can include a plurality of optical elements along the optical axis. The plurality of optical elements can include a group of optical elements and a last optical element which is closest to the image plane, and a positioning device configured to move the last optical element relative to the image plane. Typically, a projection objective is configured to be used in a microlithography projection exposure machine.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.