Daniel Kraehmer
41Patents
6h-index
59Co-inventors
68Inventor score
Filing activity: May 8, 2003 → Jan 24, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7408616B2 | Microlithographic exposure method as well as a projection exposure system for carrying out the method | Physics | 76 | Expired |
| US7847921B2 | Microlithographic exposure method as well as a projection exposure system for carrying out the method | Physics | 47 | Active |
| US6806942B2 | Projection exposure system | Physics | 22 | Expired |
| US7239450B2 | Method of determining lens materials for a projection exposure apparatus | Physics | 16 | Expired |
| US7463422B2 | Projection exposure apparatus | Physics | 16 | Active |
| US7463423B2 | Lithography projection objective, and a method for correcting image defects of the same | Physics | 6 | Active |
| US9535332B2 | Mask for EUV lithography, EUV lithography system and method for optimising the imaging of a mask | Physics | 6 | Active |
| US7728975B1 | Method for describing, evaluating and improving optical polarization properties of a microlithographic projection exposure apparatus | Physics | 5 | Active |
| US6992834B2 | Objective with birefringent lenses | Physics | 4 | Expired |
| US7692868B2 | Lithography projection objective, and a method for correcting image defects of the same | Physics | 4 | Active |
| US8031326B2 | Illumination system or projection lens of a microlithographic exposure system | Physics | 3 | Active |
| US8054557B2 | Lithography projection objective, and a method for correcting image defects of the same | Physics | 3 | Active |
| US8126669B2 | Optimization and matching of optical systems by use of orientation Zernike polynomials | Physics | 2 | Active |
| US8879159B2 | Lithography projection objective, and a method for correcting image defects of the same | Physics | 2 | Active |
| US7239447B2 | Objective with crystal lenses | Physics | 2 | Expired |
| US7982969B2 | Projection objective of a microlithographic projection exposure apparatus | Physics | 1 | Active |
| US9645503B2 | Collector | Physics | 1 | Active |
| US7317508B2 | Optical system and method for the production of micro-structured components by microlithography | Physics | 1 | Expired |
| US9551941B2 | Illumination system for an EUV lithography device and facet mirror therefor | Physics | 1 | Active |
| US7808615B2 | Projection exposure apparatus and method for operating the same | Physics | 1 | Active |
| US7903333B2 | Polarization-modulating optical element and method for manufacturing thereof | Emerging Cross-Sectional Technologies | 1 | Active |
| US9316922B2 | Lithography projection objective, and a method for correcting image defects of the same | Physics | 1 | Active |
| US9097984B2 | Microlithography projection objective | Physics | 1 | Active |
| US7961297B2 | Method for determining intensity distribution in the image plane of a projection exposure arrangement | Physics | 1 | Active |
| US9063439B2 | Projection objective for microlithography with stray light compensation and related methods | Physics | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.