Modeling and cross correlation of design predicted criticalities for optimization of semiconductor manufacturing
US7694244B2 · kind B2 · utility
11Cited by
8References
15Claims
0Family size
Assignee
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Key dates
| Filing date | Dec 18, 2006 |
| Grant date | Apr 6, 2010 |
| Priority date | — |
| Expiry date | Feb 6, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/33
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for modeling and cross correlation of design predicted criticalities include a feedback loop where information from the manufacturing process is provided to cross correlation engine for optimization of semiconductor manufacturing. The information may include parametric information, functional information, and hot spots determination. The sharing of information allows for design intent to be reflected in manufacturing metrology space; thus, allowing for more intelligent metrology and reduces cycle time.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.