Emmanuel Drege
18Patents
8h-index
23Co-inventors
64Inventor score
Filing activity: Jun 3, 2002 → Dec 22, 2009
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7330279B2 | Model and parameter selection for optical metrology | Physics | 33 | Expired |
| US7171284B2 | Optical metrology model optimization based on goals | Physics | 27 | Expired |
| US7831528B2 | Optical metrology of structures formed on semiconductor wafers using machine learning systems | Physics | 24 | Active |
| US7046375B2 | Edge roughness measurement in optical metrology | Physics | 23 | Expired |
| US7216045B2 | Selection of wavelengths for integrated circuit optical metrology | Physics | 12 | Expired |
| US7694244B2 | Modeling and cross correlation of design predicted criticalities for optimization of semiconductor manufacturing | Physics | 11 | Active |
| US8407630B1 | Modeling and cross correlation of design predicted criticalities for optimization of semiconductor manufacturing | Physics | 10 | Active |
| US6853942B2 | Metrology hardware adaptation with universal library | Physics | 9 | Expired |
| US6842261B2 | Integrated circuit profile value determination | Physics | 6 | Expired |
| US7523076B2 | Selecting a profile model for use in optical metrology using a machine learning system | Physics | 6 | Expired |
| US8302052B2 | Methods, systems, and computer program product for implementing hotspot detection, repair, and optimization of an electronic circuit design | Emerging Cross-Sectional Technologies | 6 | Active |
| US7588949B2 | Optical metrology model optimization based on goals | Physics | 6 | Active |
| US7394554B2 | Selecting a hypothetical profile to use in optical metrology | Physics | 4 | Expired |
| US7505153B2 | Model and parameter selection for optical metrology | Physics | 4 | Active |
| US7665048B2 | Method and system for inspection optimization in design and production of integrated circuits | Emerging Cross-Sectional Technologies | 3 | Active |
| US8146024B2 | Method and system for process optimization | Emerging Cross-Sectional Technologies | 2 | Active |
| US8156450B2 | Method and system for mask optimization | Physics | 1 | Active |
| US7474993B2 | Selection of wavelengths for integrated circuit optical metrology | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.