Focusing system and method for a charged particle imaging system
US7696497B2 · kind B2 · utility
Assignees
Inventor
Key dates
| Filing date | Aug 24, 2005 |
| Grant date | Apr 13, 2010 |
| Priority date | — |
| Expiry date | Aug 24, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31774
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Apparatus for focusing a charged particle beam onto a surface, including a charged particle beam generator which is adapted to project the charged particle beam onto a location on the surface, thereby causing charges to be emitted from the location. The apparatus further includes an imaging detector which is adapted to receive the charges so as to form an image of the location, and an aberrating element which is positioned before the imaging detector and which is adapted to produce an aberration in the image. A processor is adapted to receive the image and to adjust at least one of the charged particle beam generator and a position of the surface in response to the aberration.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.