Patent · US Active

Systems, masks, and methods for manufacturable masks using a functional representation of polygon pattern

US7698665B2 · kind B2 · utility

49Cited by

53References

15Claims

0Family size

Assignee

Luminescent Technologies, Inc. · US

Inventors

Daniel Abrams · Palo Alto, US
David Irby · San Jose, US

Key dates

Filing date	Oct 6, 2005
Grant date	Apr 13, 2010
Priority date	—
Expiry date	Jul 11, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/68
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Photomask patterns are represented using contours defined by mask functions or other formats. Given target pattern, contours may be optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimized patterns or blocks may be simplified for mask manufacturing.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.