Inventor · Palo Alto, CA, US

Daniel Abrams

26Patents
15h-index
12Co-inventors
74Inventor score

Filing activity: Dec 12, 1997 → Jun 4, 2010

Most-cited inventions

PatentTitleAreaCited byStatus
US6058127A Tunable microcavity and method of using nonlinear materials in a photonic crystal Physics 139 Expired
US7698665B2 Systems, masks, and methods for manufacturable masks using a functional representation of polygon pattern Physics 49 Active
US7124394B1 Method for time-evolving rectilinear contours representing photo masks Physics 42 Expired
US7480889B2 Optimized photomasks for photolithography Emerging Cross-Sectional Technologies 40 Expired
US7178127B2 Method for time-evolving rectilinear contours representing photo masks Physics 40 Expired
US7707541B2 Systems, masks, and methods for photolithography Physics 40 Active
US7441227B2 Method for time-evolving rectilinear contours representing photo masks Physics 35 Active
US7571423B2 Optimized photomasks for photolithography Emerging Cross-Sectional Technologies 34 Active
US7703049B2 System, masks, and methods for photomasks optimized with approximate and accurate merit functions Emerging Cross-Sectional Technologies 29 Active
US7757201B2 Method for time-evolving rectilinear contours representing photo masks Physics 28 Active
US7703068B2 Technique for determining a mask pattern corresponding to a photo-mask Physics 25 Active
US8056021B2 Method for time-evolving rectilinear contours representing photo masks Physics 22 Active
US7992109B2 Method for time-evolving rectilinear contours representing photo masks Physics 20 Active
US7984391B2 Method for time-evolving rectilinear contours representing photo masks Physics 20 Active
US8200002B2 Photo-mask and wafer image reconstruction Physics 16 Active
US8208712B2 Photo-mask and wafer image reconstruction Physics 15 Active
US8204295B2 Photo-mask and wafer image reconstruction Physics 15 Active
US8331645B2 Photo-mask and wafer image reconstruction Physics 13 Active
US8260032B2 Photo-mask and wafer image reconstruction Physics 12 Active
US8280146B2 Photo-mask and wafer image reconstruction Physics 11 Active
US7921385B2 Mask-pattern determination using topology types Physics 6 Active
US7793253B2 Mask-patterns including intentional breaks Physics 5 Active
US8644588B2 Photo-mask and wafer image reconstruction Physics 5 Active
US8111380B2 Write-pattern determination for maskless lithography Physics 4 Active
US7788627B2 Lithography verification using guard bands Physics 4 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.