Optical enhancement of integrated circuit photodetectors
US7704780B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 18, 2008 |
| Grant date | Apr 27, 2010 |
| Priority date | — |
| Expiry date | Nov 18, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F39/8067
Abstract
A semiconductor integrated circuit structure and method for fabricating. The semiconductor integrated circuit structure includes a light sensitive device integral with a semiconductor substrate, a cover dielectric layer disposed over the light sensitive device, and a lens-formation dielectric layer disposed over the cover dielectric layer. Light is transmittable though the cover dielectric layer, and through the lens-formation dielectric layer. The lens-formation dielectric layer forms an embedded convex microlens. The microlens directs light onto the light sensitive device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.