System and method to determine focus parameters during an electron beam inspection
US7705298B2 · kind B2 · utility
10Cited by
5References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 13, 2007 |
| Grant date | Apr 27, 2010 |
| Priority date | — |
| Expiry date | Nov 12, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
This invention relates to apparatus and method to fast determine focus parameters in one pre-scan during an e-beam inspection practice. More specifically, embodiments of the present invention provide an apparatus and method that provide accurate focus tuning after primary focusing has been done.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.