Zhong-Wei Chen
53Patents
10h-index
54Co-inventors
81Inventor score
Filing activity: Jan 11, 1995 → Sep 28, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5578821A | Electron beam inspection system and method | Electricity | 268 | Expired |
| US5717204A | Inspecting optical masks with electron beam microscopy | Electricity | 95 | Expired |
| US7105436B2 | Method for in-line monitoring of via/contact holes etch process based on test structures in semiconductor wafer manufacturing | Electricity | 83 | Expired |
| US5665968A | Inspecting optical masks with electron beam microscopy | Electricity | 72 | Expired |
| US6392231B1 | Swinging objective retarding immersion lens electron optics focusing, deflection and signal collection system and method | Electricity | 33 | Expired |
| US7872236B2 | Charged particle detection devices | Electricity | 18 | Active |
| US7705301B2 | Electron beam apparatus to collect side-view and/or plane-view image with in-lens sectional detector | Electricity | 13 | Active |
| US7759653B2 | Electron beam apparatus | Electricity | 11 | Active |
| US8752030B1 | Process abstraction and tracking, systems and methods | Physics | 11 | Active |
| US7705298B2 | System and method to determine focus parameters during an electron beam inspection | Electricity | 10 | Active |
| US6960766B2 | Swinging objective retarding immersion lens electron optics focusing, deflection and signal collection system and method | Electricity | 9 | Expired |
| US7893406B1 | Electron gun with magnetic immersion double condenser lenses | Electricity | 8 | Active |
| US6605805B2 | Swinging objective retarding immersion lens electron optics focusing, deflection and signal collection system and method | Electricity | 8 | Expired |
| US6710342B1 | Method and apparatus for scanning semiconductor wafers using a scanning electron microscope | Electricity | 7 | Expired |
| US7928383B2 | Charged particle system including segmented detection elements | Electricity | 4 | Active |
| US7335879B2 | System and method for sample charge control | Electricity | 4 | Active |
| US7474001B2 | Method for in-line monitoring of via/contact holes etch process based on test structures in semiconductor wafer manufacturing | Electricity | 4 | Active |
| US8218284B2 | Apparatus for increasing electric conductivity to a semiconductor wafer substrate when exposure to electron beam | Emerging Cross-Sectional Technologies | 3 | Active |
| US10892138B2 | Multi-beam inspection apparatus with improved detection performance of signal electrons | Electricity | 2 | Active |
| US8314401B2 | Electron gun with magnetic immersion double condenser lenses | Electricity | 2 | Active |
| US11289304B2 | Apparatus using multiple beams of charged particles | Electricity | 2 | Active |
| US8229114B2 | Identity-based key generating methods and devices | Electricity | 2 | Active |
| US11222766B2 | Multi-cell detector for charged particles | Electricity | 2 | Active |
| US11676793B2 | Apparatus of plural charged particle beams | Electricity | 1 | Active |
| US11282675B2 | Multi-beam inspection apparatus with improved detection performance of signal electrons | Electricity | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.