Patent · US Active

System and method for absorbance modulation lithography

US7713684B2 · kind B2 · utility

7Cited by

4References

4Claims

0Family size

Assignee

Massachusetts Institute of Technology · US

Inventors

Rajesh Menon · Boston, US
Henry I. Smith · Sudbury, US

Key dates

Filing date	Dec 18, 2008
Grant date	May 11, 2010
Priority date	—
Expiry date	Dec 18, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/001
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A lithography system is disclosed that provides an array of areas of imaging electromagnetic energy that are directed toward a recording medium. The reversible contrast-enhancement material is disposed between the recording medium and the array of areas of imaging electromagnetic energy.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.