Apparatus and method for obtaining topographical dark-field images in a scanning electron microscope
US7714287B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 19, 2008 |
| Grant date | May 11, 2010 |
| Priority date | — |
| Expiry date | Nov 27, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2803
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron beam apparatus is configured for dark field imaging of a substrate surface. Dark field is defined as an operational mode where the image contrast is sensitive to topographical features on the surface. A source generates a primary electron beam, and scan deflectors are configured to deflect the primary electron beam so as to scan the primary electron beam over the substrate surface whereby secondary and/or backscattered electrons are emitted from the substrate surface, said emitted electrons forming a scattered electron beam. A beam separator is configured to separate the scattered electron beam from the primary electron beam. The apparatus includes a cooperative arrangement which includes at least a ring-like element, a first grid, and a second grid. The ring-like element and the first and second grids each comprises conductive material. A segmented detector assembly is positioned to receive the scattered electron beam after the scattered electron beam passes through the cooperative arrangement. Other embodiments, aspects and features are also disclosed. The apparatus is configured to yield good topographical contrast, high signal to noise ratio, and to accommodate a va…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.