Patent · US Active

Integrated circuits and methods of manufacturing thereof

US7714377B2 · kind B2 · utility

13Cited by
0References
35Claims
0Family size

Assignees

Inventors

Key dates

Filing dateApr 19, 2007
Grant dateMay 11, 2010
Priority date
Expiry dateAug 20, 2028

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T29/49117
  • WIPO fieldComputer technology
  • WIPO sectorElectrical engineering

Abstract

Embodiments of the invention relate to integrated circuits having a memory cell arrangement and methods of manufacturing thereof. In one embodiment of the invention, an integrated circuit has a memory cell arrangement which includes a fin structure extending in its longitudinal direction as a first direction, including a first insulating layer, a first active region disposed above the first insulating layer, a second insulating layer disposed above the first active region, a second active region disposed above the second insulating layer, a charge storage layer structure disposed at least next to at least one sidewall of the fin structure covering at least a portion of the first active region and at least a portion of the second active region, and a control gate disposed next to the charge storage layer structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.