Patent · US Active

Illumination system for a microlithography projection exposure installation

US7714983B2 · kind B2 · utility

29Cited by

18References

35Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Jess Koehler · Markdorf, DE
Johannes Wangler · Oberkochen, DE
Markus Brotsack · Aalen, DE
Wolfgang Singer · Aalen, DE
Damian Fiolka · Oberkochen, DE
Manfred Maul · Aalen, DE

Key dates

Filing date	Sep 13, 2004
Grant date	May 11, 2010
Priority date	—
Expiry date	Oct 12, 2026

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/702
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.