Wolfgang Singer
123Patents
16h-index
139Co-inventors
89Inventor score
Filing activity: Sep 29, 2000 → Jun 23, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6438199B1 | Illumination system particularly for microlithography | Physics | 80 | Expired |
| US10191288B2 | Optical system and method for transmitting a source image | Physics | 71 | Active |
| US6658084B2 | Illumination system with variable adjustment of the illumination | Physics | 59 | Expired |
| US7511886B2 | Optical beam transformation system and illumination system comprising an optical beam transformation system | Physics | 56 | Expired |
| US7256932B2 | Optical system for ultraviolet light | Physics | 36 | Expired |
| US6646718B2 | Projection objective having adjacently mounted aspheric lens surfaces | Physics | 30 | Expired |
| US7714983B2 | Illumination system for a microlithography projection exposure installation | Physics | 29 | Active |
| US7196841B2 | Lighting system, particularly for use in extreme ultraviolet (EUV) lithography | Physics | 22 | Expired |
| US6806942B2 | Projection exposure system | Physics | 22 | Expired |
| US7321126B2 | Collector with fastening devices for fastening mirror shells | Physics | 22 | Expired |
| US6859328B2 | Illumination system particularly for microlithography | Physics | 20 | Expired |
| US7015489B2 | Collector having unused region for illumination systems using a wavelength less than or equal to 193 nm | Physics | 20 | Expired |
| US7116394B2 | Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system | Physics | 19 | Expired |
| US7605386B2 | Optical device with raster elements, and illumination system with the optical device | Physics | 18 | Active |
| US6964485B2 | Collector for an illumination system with a wavelength of less than or equal to 193 nm | Physics | 16 | Expired |
| US7385764B2 | Objectives as a microlithography projection objective with at least one liquid lens | Physics | 16 | Expired |
| US7354168B2 | Facet mirror having a number of mirror facets | Physics | 13 | Expired |
| US6891980B2 | Method and apparatus for analysis of schlieren | Physics | 12 | Expired |
| US7075433B2 | Bluetooth theft control | Physics | 12 | Expired |
| US7329886B2 | EUV illumination system having a plurality of light sources for illuminating an optical element | Physics | 11 | Expired |
| US7473907B2 | Illumination system for a wavelength of ≦ 193 nm, with sensors for determining an illumination | Physics | 11 | Active |
| US7583433B2 | Multi mirror system for an illumination system | Emerging Cross-Sectional Technologies | 10 | Expired |
| US7466489B2 | Projection objective having a high aperture and a planar end surface | Physics | 10 | Expired |
| US6972841B2 | Method and apparatus for determining the non-volatile component of aerosol particles in a gas sample | Physics | 10 | Expired |
| US7186983B2 | Illumination system particularly for microlithography | Physics | 9 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.