Apparatus and method for preparing samples
US7722818B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Sep 16, 2004 |
| Grant date | May 25, 2010 |
| Priority date | — |
| Expiry date | Aug 26, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31745
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Apparatus and method capable of preparing samples adapted for observations by electron microscopy. Each sample is ion-etched. During this process, the sample stage is tilted reciprocably left and right about a tilting axis. The sample is ion-etched together with a shielding material. The sample may contain a substance that is not easily etched by the ion beam. In the present invention, such unetched portions are not produced in spite of the presence of the substance. The substance can be separated from the sample. The ion beam is directed at the sample with the boundary defined by an end surface of the shielding material. Portions of the sample at a processing position and its vicinities are etched by the beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.