Method for producing shock and tamper resistant microelectronic devices
US7723162B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 19, 2007 |
| Grant date | May 25, 2010 |
| Priority date | — |
| Expiry date | Apr 11, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/181
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method of producing a microelectronic device resistant to tampering, inspection and damage from surrounding environment or operating conditions includes: (i) applying an adhesion layer on a circuit including a die fixed and electrically connected to a laminate substrate; (ii) spraying, through a flame spray process, a tamper resistant coating over the applied adhesion layer; (iii) applying a first encapsulant for filling spaces and air pockets; (iv) removing air and gases from the first encapsulant; and (v) applying a second encapsulant around the first encapsulant for providing a moisture barrier 42 and handling surfaces for the microelectronic device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.