Curtis Anderson
20Patents
7h-index
18Co-inventors
66Inventor score
Filing activity: Oct 27, 1995 → Jul 3, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5877093A | Process for coating an integrated circuit device with a molten spray | Electricity | 27 | Expired |
| US6319740A | Multilayer protective coating for integrated circuits and multichip modules and method of applying same | Electricity | 25 | Expired |
| US6110537A | Coating integrated circuits using thermal spray | Electricity | 16 | Expired |
| US9514959B2 | Fluorocarbon molecules for high aspect ratio oxide etch | Chemistry; Metallurgy | 12 | Active |
| US5762711A | Coating delicate circuits | Electricity | 11 | Expired |
| US6287985A | Process for applying a molten droplet coating for integrated circuits | Electricity | 8 | Expired |
| US6072580A | Method for anodically bonding an electrode to a ring laser gyro block | Physics | 8 | Expired |
| US7723162B2 | Method for producing shock and tamper resistant microelectronic devices | Electricity | 7 | Active |
| US7208046B1 | Spray coating apparatus and fixtures | Electricity | 5 | Expired |
| US8932674B2 | Vapor deposition methods of SiCOH low-k films | Electricity | 2 | Active |
| US9892932B2 | Chemistries for TSV/MEMS/power device etching | Chemistry; Metallurgy | 1 | Active |
| US10103031B2 | Chemistries for TSV/MEMS/power device etching | Chemistry; Metallurgy | 1 | Active |
| US7524537B2 | Spray coating apparatus and fixtures | Electricity | 1 | Expired |
| US9773679B2 | Method of etching semiconductor structures with etch gas | Performing Operations; Transporting | 0 | Active |
| US10720335B2 | Chemistries for TSV/MEMS/power device etching | Chemistry; Metallurgy | 0 | Active |
| US11152223B2 | Fluorocarbon molecules for high aspect ratio oxide etch | Chemistry; Metallurgy | 0 | Active |
| US10115600B2 | Method of etching semiconductor structures with etch gas | Performing Operations; Transporting | 0 | Active |
| US8999734B2 | Cyclic amino compounds for low-k silylation | Electricity | 0 | Active |
| US10381240B2 | Fluorocarbon molecules for high aspect ratio oxide etch | Chemistry; Metallurgy | 0 | Active |
| US8210120B2 | Systems and methods for building tamper resistant coatings | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.