Patent · US Expired

Method of manufacturing an optical element

US7728987B2 · kind B2 · utility

4Cited by

10References

18Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Ralf Arnold · Aalen, DE
Bernd Dörband · Aalen, DE
Frank Schillke · Aalen, DE
Susanne Beder · Aalen, DE

Key dates

Filing date	May 14, 2004
Grant date	Jun 1, 2010
Priority date	—
Expiry date	May 28, 2025

Classification

Technology area (CPC G)Physics
CPC primaryG01B11/2441
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A method of manufacturing an optical element includes testing the optical element by using an interferometer optics generating a beam of measuring light illuminating only a sub-aperture of the tested optical element. The interferometer optics comprises a hologram. Results of the sub-aperture measurement are stitched together to obtain a measuring result with respect to the full surface of the optical element. Further, a method of calibrating the interferometer optics includes performing an interferometric measurement using a calibrating optics having a hologram covering only a sub-aperture of the full cross section of the beam of measuring light generated by the interferometer optics and stitching together the sub-aperture measurements to obtain a result indicative for the full cross section of the interferometer optics.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.