Susanne Beder
32Patents
7h-index
50Co-inventors
68Inventor score
Filing activity: May 14, 2004 → Jun 7, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7301707B2 | Projection optical system and method | Physics | 19 | Expired |
| US7385764B2 | Objectives as a microlithography projection objective with at least one liquid lens | Physics | 16 | Expired |
| US7061626B1 | Method of manufacturing an optical element using a hologram | Physics | 13 | Expired |
| US7466489B2 | Projection objective having a high aperture and a planar end surface | Physics | 10 | Expired |
| US7848031B2 | Hologram and method of manufacturing an optical element using a hologram | Physics | 9 | Active |
| US7428105B2 | Objectives as a microlithography projection objective with at least one liquid lens | Physics | 8 | Active |
| US8208199B2 | Catadioptric projection objective | Physics | 7 | Active |
| US7570343B2 | Microlithographic projection exposure apparatus | Physics | 7 | Expired |
| US8208198B2 | Catadioptric projection objective | Physics | 6 | Active |
| US7589903B2 | Projection objective adapted for use with different immersion fluids or liquids, method of conversion of such and production method | Physics | 5 | Active |
| US7782440B2 | Projection lens system of a microlithographic projection exposure installation | Physics | 4 | Active |
| US7728987B2 | Method of manufacturing an optical element | Physics | 4 | Expired |
| US8031326B2 | Illumination system or projection lens of a microlithographic exposure system | Physics | 3 | Active |
| US10606048B2 | Imaging optical unit for a metrology system for examining a lithography mask | Physics | 2 | Active |
| US7835073B2 | Projection objective for lithography | Physics | 1 | Active |
| US8319944B2 | Projection lens system of a microlithographic projection exposure installation | Physics | 1 | Active |
| US11119413B2 | Imaging optical unit for imaging an object field into an image field | Physics | 1 | Active |
| US7982969B2 | Projection objective of a microlithographic projection exposure apparatus | Physics | 1 | Active |
| US8355201B2 | Catadioptric projection objective | Physics | 0 | Active |
| US7782538B2 | Projection objective having a high aperture and a planar end surface | Physics | 0 | Active |
| US7474469B2 | Arrangement of optical elements in a microlithographic projection exposure apparatus | Physics | 0 | Expired |
| US7710640B2 | Projection objective of a microlithographic projection exposure apparatus | Physics | 0 | Active |
| US12085780B2 | Optical system, heating arrangement, and method for heating an optical element in an optical system | Electricity | 0 | Active |
| US9164396B2 | Projection lens system of a microlithographic projection exposure installation | Physics | 0 | Active |
| US7719658B2 | Imaging system for a microlithographical projection light system | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.