Patent · US Active

Optical system having a cleaning arrangement

US7732789B2 · kind B2 · utility

0Cited by

2References

17Claims

0Family size

Assignee

KONINKLIJKE PHILIPS ELECTRONICS NV · NL

Inventors

Peter Zink · Aachen, DE
Gunther Hans Derra · Aachen, DE

Key dates

Filing date	Jul 18, 2005
Grant date	Jun 8, 2010
Priority date	—
Expiry date	Jun 11, 2027

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70933
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A cleaning arrangement for an optical system and in particular for an optical system designed for EUV radiation. The cleaning arrangement has a gas inlet (28) for a reactive gas (29). Contaminants (23) that have deposited on the surface of optical elements (110) are detached by the reactive gas. Also provided are getter surfaces (32) that are preferably arranged opposite the surfaces to be clean and by which the contaminants detached from these surfaces are absorbed. This absorption may take place as a result of condensation on the getter surface and also by chemical reaction.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.