Lithographic apparatus and device manufacturing method utilizing a flat panel display handler with conveyor device and substrate handler
US7738081B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 6, 2005 |
| Grant date | Jun 15, 2010 |
| Priority date | — |
| Expiry date | Mar 12, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/141
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus can include an illumination system that conditions a radiation beam, a patterning device that modulates the radiation beam, a substrate table that supports a substrate, and a projection system that projects the modulated radiation beam onto a target portion of the substrate. The lithographic apparatus can also include a substrate handler that loads and/or unloads a substrate on/from the substrate table. The substrate handler supports the substrate in a support plane and can include a conveyor device for moving the substrate in a direction substantially parallel to the support plane. The conveyor device can include a gripping device configured to push or pull the substrate in the indicated direction and a driving device for driving the gripping device in the indicated direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.