CMOS compatible integrated dielectric optical waveguide coupler and fabrication

US7738753B2 · kind B2 · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Solomon Assefa · Ossining, US
• Christopher V. Jahnes · Upper Saddle River, US
• Yurii A. Vlasov · Katonah, US

Key dates

• Filing date: Jun 30, 2008
• Grant date: Jun 15, 2010
• Expiry date: Aug 22, 2028

Classification

• Technology area (CPC G): Physics
• CPC primary: G02B6/1223
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An optoelectronic circuit fabrication method and integrated circuit apparatus fabricated therewith. Integrated circuits are fabricated with an integral optical coupling transition to efficiently couple optical energy from an optical fiber to an integrated optical waveguide on the integrated circuit. Layers of specific materials are deposited onto a semiconductor circuit to support etching of a trench to receive an optical coupler that performs proper impedance matching between an optical fiber and an on-circuit optical waveguide that extends part way into the transition channel. A silicon based dielectric that includes at least a portion with a refractive index substantially equal to a section of the optical fiber is deposited into the etched trench to create the optical coupler. Silicon based dielectrics with graded indices are also able to be used. Chemical mechanical polishing is used finalize preparation of the optical transition and integrated circuit.