Patent · US Active

Micropump having a pump diaphragm and a polysilicon layer

US7740459B2 · kind B2 · utility

4Cited by
3References
3Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 7, 2004
Grant dateJun 22, 2010
Priority date
Expiry dateDec 23, 2026

Classification

  • Technology area (CPC F)Mechanical Engineering; Lighting; Heating
  • CPC primaryF04B43/043
  • WIPO fieldEngines, pumps, turbines
  • WIPO sectorMechanical engineering

Abstract

A method for producing a micromechanical component, preferably for fluidic applications having cavities. The component is constructed from two functional layers, the two functional layers being patterned differently using micromechanical methods. A first etch stop layer having a first pattern is applied to a base plate. A first functional layer is applied to the first etch stop layer and to the first contact surfaces of the base plate. A second etch stop layer, having a second pattern, is applied to first functional layer. A second functional layer is applied to the second etch stop layer and to the second contact surfaces of the first functional layer. An etching mask is applied to the second functional layer. The second and the first functional layer are patterned as sacrificial layers by the use of the first and the second etch stop layer by etching methods and/or by using the first and the second etch stop layer. By supplementing patterning of the base plate, additional movable fluidic elements may be implemented, using the method. The method is preferably used for producing a micropump having an epitactic polysilicon layer as the pump diaphragm.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.