Patent · US Expired

Process for structuring at least one year as well as electrical component with structures from the layer

US7741227B2 · kind B2 · utility

0Cited by

23References

20Claims

0Family size

Assignee

OSRAM Opto Semiconductors GmbH · DE

Inventors

Maja Hackenberger · Nittendorf, DE
Johannes Voelkl · Erlangen, DE
Roland Zeisel · Tegernheim, DE

Key dates

Filing date	Apr 21, 2005
Grant date	Jun 22, 2010
Priority date	—
Expiry date	Apr 21, 2025

Classification

Technology area (CPC H)Electricity
CPC primaryH01L2924/0002
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

A process for structuring at least one layer as well as an electrical component with structures from the layer are described.The invention states a process to generate at least one structured layer (10A), wherein a mask structure (20) with a first (20A) and second structure (20B) is generated on a layer (10) which is present on a substrate (5). Through this mask structure (20), the first layer (20A) is transferred onto the layer (10) using isotropic structuring processes, and the second structure (20B) is transferred onto the layer (10) using anisotropic structuring processes. The process as per the invention permits the generation of two structures (20A, 20B) in at least a single layer while using a single mask structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.