Non contact method and apparatus for measurement of sheet resistance of p-n junctions
US7741833B1 · kind B1 · utility
2Cited by
2References
1Claims
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Key dates
| Filing date | Aug 2, 2006 |
| Grant date | Jun 22, 2010 |
| Priority date | — |
| Expiry date | Jun 25, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/2648
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A contactless sheet resistance measurement apparatus and method for measuring the sheet resistance of upper layer of ultra shallow p-n junction is disclosed. The apparatus comprises alternating light source optically coupled with first transparent and conducting electrode brought close to the wafer, the second electrode placed outside of illumination area. Using the measurement of the surface photovoltage signals inside illuminated area and outside this area and its phase shifts, linear SPV model describing its lateral distribution the sheet resistance and p-n junction conductance is determined.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.