Negative resist composition
US7749677B2 · kind B2 · utility
0Cited by
2References
6Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 11, 2005 |
| Grant date | Jul 6, 2010 |
| Priority date | — |
| Expiry date | Dec 27, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/143
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The negative resist composition of the present invention comprises a silsesguioxane resin (A) comprising a constituent unit (a1) represented by the following general formula (I) and a constituent unit (a2) represented by the following general formula (II), an acid generator component (B) which generates an acid upon exposure, and a crosslinking agent component (C):wherein R1 represents a linear or branched alkylene group having 1 to 5 carbon atoms, and
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.