System and method for introducing a substrate into a process chamber
US7750818B2 · kind B2 · utility
11Cited by
2References
15Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 18, 2007 |
| Grant date | Jul 6, 2010 |
| Priority date | — |
| Expiry date | Aug 12, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/139
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A system and method for introducing a substrate into a process chamber is provided. A presence or absence of a substrate on a stage in an apparatus for manufacturing a semiconductor or a flat panel display may be determined by lift pins used for loading and unloading a substrate, the introduction of another substrate may be prevented and a broken state or the erroneously loaded state of the substrate may be detected. An opening or closing of a gate valve may also be determined, and the introduction of a substrate into the process chamber may be prevented while the gate valve is closed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.