Micromachined mass flow sensor and methods of making the same
US7752910B2 · kind B2 · utility
5Cited by
9References
19Claims
0Family size
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Key dates
| Filing date | Apr 3, 2008 |
| Grant date | Jul 13, 2010 |
| Priority date | — |
| Expiry date | Apr 3, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03H2240/23
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mass flow sensor is supported on an N or P-type silicon substrate with orientation <100>. This mass flow sensor comprises a central thin-film heater and a pair of thin-film heat sensing elements, and a thermally isolated membrane for supporting the heater and the sensors out of contact with the substrate base. The mass flow sensor is arranged for integration on a same silicon substrate to form a one-dimensional or two-dimensional array in order to expand the dynamic measurement range.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.