Method of making MoO2 powders, products made from MoO2 powders, deposition of MoO2 thin films, and methods of using such materials

US7754185B2 · kind B2 · utility

Assignee

• H.C. STARCK INC. · US

Inventors

• Lawrence F. McHugh · North Andover, US
• Prabhat Kumar · Framingham, US
• David Meendering · Coldwater, US
• Richard Wu · North Chelmsford, US
• Gerhard Wotting · Coburg, DE
• Richard D. Nicholson · Capitola, US

Key dates

• Filing date: Jan 18, 2006
• Grant date: Jul 13, 2010
• Expiry date: May 13, 2029

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10K50/813
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

The invention relates to high purity MoO2 powder by reduction of ammonium molybdate or molybdenum trioxide using hydrogen as the reducing agent in a rotary or boat furnace. Consolidation of the powder by press/sintering, hot pressing, and/or HIP is used to make discs, slabs, or plates, which are used as sputtering targets. The MoO2 disc, slab, or plate form is sputtered on a substrate using a suitable sputtering method or other physical means to provide a thin film having a desired film thickness. The thin films have properties such as electrical, optical, surface roughness, and uniformity comparable or superior to those of indium-tin oxide (ITO) and zinc-doped ITO in terms of transparency, conductivity, work function, uniformity, and surface roughness. The MoO2 and MoO2 containing thin films can be used in organic light-emitting diodes (OLED), liquid crystal display (LCD), plasma display panel (PDP), field emission display (FED), thin film solar cell, low resistivity ohmic contacts, and other electronic and semiconductor devices.