Patent · US Active

Tungsten and molybdenum compounds and their use for chemical vapour deposition (CVD)

US7754908B2 · kind B2 · utility

8Cited by

0References

8Claims

0Family size

Assignee

H.C. Starck Clevios GmbH · DE

Inventors

Knud Reuter · Krefeld, DE
Jörg Sundermeyer · Marburg, DE
Alexei Merkoulov · Glückstadt, DE
Wolfgang Stolz · Marburg, DE
Kestin Volz · Steffenberg, DE
Michael Pokoj · Reiskirchen, DE
Thomas L. Ochs · Munich, DE

Key dates

Filing date	Jan 4, 2007
Grant date	Jul 13, 2010
Priority date	—
Expiry date	Jan 10, 2028

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/12174
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

The present invention relates to specific novel tungsten and molybdenum compoundsto the use thereof for the deposition of tungsten- or molybdenum-containing layers by means of chemical vapour deposition, and to the tungsten- or molybdenum-containing layers produced by this process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.