Method and apparatus for preventing instabilities in radio-frequency plasma processing
US7755300B2 · kind B2 · utility
62Cited by
13References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 31, 2006 |
| Grant date | Jul 13, 2010 |
| Priority date | — |
| Expiry date | Apr 2, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for controlling a power supply to prevent instabilities due to dynamic loads in RF plasma processing systems, operating at frequencies of from 1 MHz and up 1 MHz and above. The apparatus includes a power source, a power converter receiving power from the source, the power converter providing a constant output power controlled by varying at least one of input voltage or switching frequency, and an RF generator receiving constant power from the power converter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.