Patent · US Active

Directional coupler

US7755451B2 · kind B2 · utility

3Cited by

7References

23Claims

0Family size

Assignee

HUETTINGER Elektronik GmbH + Co. KG · DE

Inventors

Daniel Krausse · Mountain View, US
Christoph Gerhardt · Glückstadt, DE
Peter Riessle · Selters (Westerwald), DE
Thomas Kirchmeier · Teningen, DE
Erich Pivit · Allmersbach im Tal, DE

Key dates

Filing date	Mar 21, 2007
Grant date	Jul 13, 2010
Priority date	—
Expiry date	Dec 30, 2027

Classification

Technology area (CPC H)Electricity
CPC primaryH01P5/187
WIPO fieldTelecommunications
WIPO sectorElectrical engineering

Abstract

An HF plasma process excitation configuration includes an HF generator that is connected to a plasma load through a directional coupler. The directional coupler includes a transmission line, a first coupling line for detecting reflected power from the plasma load, and a second coupling line for detecting forward power from the HF generator, is the first coupling line is spaced apart from the transmission line and is terminated at least at one end with a termination resistance. The second coupling line is spaced apart from the transmission line and is terminated at least at one end with a termination resistance. Each coupling line has a predetermined and adjusted characteristic impedance, and the termination resistances each have a resistance value that corresponds within a tolerance to the characteristic impedance of the associated coupling line with a tolerance.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.