Patent · US Active

Method for time-evolving rectilinear contours representing photo masks

US7757201B2 · kind B2 · utility

28Cited by

53References

19Claims

0Family size

Assignee

Luminescent Technologies, Inc. · US

Inventors

Daniel Abrams · Palo Alto, US
Danping Peng · Fremont, US
Stanley Osher · Santa Monica, US

Key dates

Filing date	Feb 12, 2007
Grant date	Jul 13, 2010
Priority date	—
Expiry date	Aug 3, 2027

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/36
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.