Patent · US Active

Method and system for manufacturing a reticle using character projection particle beam lithography

US7759026B2 · kind B2 · utility

18Cited by

10References

16Claims

0Family size

Assignee

D2S, Inc. · US

Inventors

Akira Fujimura · Saratoga, US
Lance Glasser · Saratoga, US
Takashi Mitsuhashi · Fujisawa, JP
Kazuyuki Hagiwara · Wako, JP

Key dates

Filing date	Sep 1, 2008
Grant date	Jul 20, 2010
Priority date	—
Expiry date	Jan 27, 2029

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S430/143
WIPO fieldMicro-structural and nano-technology
WIPO sectorChemistry

Abstract

A method for manufacturing a surface, the surface having a multiplicity of slightly different patterns, is disclosed with the method comprising the steps of designing a stencil mask having a set of characters for forming the patterns on the surface and reducing shot count or total write time by use of a character varying technique. A system for manufacturing a surface is also disclosed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.