Patent · US Active

Self-shading electrodes for debris suppression in an EUV source

US7759663B1 · kind B1 · utility

2Cited by

3References

20Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Maarten Marinus Johannes Wilhelmus Van Herpen · Heesch, NL
Wouter Anthon Soer · Nijmegen, NL

Key dates

Filing date	Dec 6, 2006
Grant date	Jul 20, 2010
Priority date	—
Expiry date	Sep 18, 2027

Classification

Technology area (CPC H)Electricity
CPC primaryH05G2/0094
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A radiation source having self-shading electrodes is disclosed. Debris originating from the electrodes is reduced. The path from the electrodes to the EUV optics is blocked by part of the electrodes themselves (termed self-shading). This may significantly reduce the amount of electrode-generated debris.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.