Technology migration for integrated circuits with radical design restrictions
US7761821B2 · kind B2 · utility
6Cited by
25References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 13, 2007 |
| Grant date | Jul 20, 2010 |
| Priority date | — |
| Expiry date | Jul 25, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/39
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. The invention implements a minimum layout perturbation approach that addresses the RDR requirements. The invention also solves the problem of inserting dummy shapes where required, and extending the lengths of the critical shapes and/or the dummy shapes to meet ‘edge coverage’ requirements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.