Barrier formation and structure to use in semiconductor devices
US7768126B2 · kind B2 · utility
1Cited by
5References
6Claims
0Family size
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Key dates
| Filing date | Sep 29, 2006 |
| Grant date | Aug 3, 2010 |
| Priority date | — |
| Expiry date | Mar 10, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Embodiments of barriers to use in semiconductor devices are presented herein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.