Patent · US Active

Optical assembly, projection exposure apparatus and projection objective

US7768721B2 · kind B2 · utility

2Cited by

2References

26Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Jochen Weber · Laufenbürg, DE
Erich Merz · Oberkochen, DE
Ole Fluegge · Heubach, DE
Kai-Uwe Berroth · Heldenfingen, DE
Cornelia Buehler · Oberkochen, DE
Markus Hauf · Ulm, DE

Key dates

Filing date	Jun 20, 2008
Grant date	Aug 3, 2010
Priority date	—
Expiry date	Jan 27, 2029

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70825
WIPO fieldOptics
WIPO sectorInstruments

Abstract

In some embodiments, the disclosure relates to an optical assembly that includes an optical element and a structure element. A gap runs between the optical element and the structure element. A sealing element may be present to seal the gap. At least one liquid layer may be arranged between the structure element and/or the optical element, and the sealing element so that a relative displacement of the sealing element with respect to the structure element and/or the optical element is possible in the direction of the layer plane.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.